UB - University at Buffalo, The State University of New York Electrical Engineering

Electron-beam lithography

To demonstrate electron-beam lithography as a nanofabrication process, two UB EE groups produced a chromium UB emblem on a silicon substrate, with a minimum line-width of about 5 nanometers. The fabricated structure is shown below:

E-Beam Lithography - UB Emblem

 

Calendar

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