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Class 100 Clean Room
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Electron Beam Vacuum Evaporator with 0.1Micro Torr Capability
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Automated Cryogenic System for Current-Voltage-Temperature Analysis
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Photoresist Equipment including Mask Aligner
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Bio-Rad Deep Level Transient Spectrometer
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Trion Plasma Enhanced Chemical Vapor Deposition (PECVD) System
- Hydrogen Generator
- 3 Furnaces for Alloying or Diffusion
- Wafer and Device Probe Station
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Wire Bonder
- First and Second Reduction Camera System
- Reactive Ion Etch
- 3-Target Sputter System
- Ozone cleaning system
- RTA
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Gaertner Ellipsometer
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HP4280 C&G-V Plotter
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Keithley 6517 High Resistance System
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Schoeffel GM 100 Monochromator
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Boonton 72B Capacitance Meter
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Keithley 480 Picoammeter and 616 Digital Elecctrometer
- Sub-Micro Analytical Probe System
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Princeton Applied Research Model 5204 AND 5301 Lock-In-Amplifier Systems
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- Deposition of most dielectric and metallic materials by evaporation or plasma
- Fabrication of electronic devices in a class 100 clean room
- Electrical analysis of materials and devices
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