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>>Important Facilities
  • Class 100 Clean Room
  • Electron Beam Vacuum Evaporator with 0.1Micro Torr Capability
  • Automated Cryogenic System for Current-Voltage-Temperature Analysis
  • Photoresist Equipment including Mask Aligner
  • Bio-Rad Deep Level Transient Spectrometer
  • Trion Plasma Enhanced Chemical Vapor Deposition (PECVD) System
  • Hydrogen Generator
  • 3 Furnaces for Alloying or Diffusion
  • Wafer and Device Probe Station
  • Wire Bonder
  • First and Second Reduction Camera System
  • Reactive Ion Etch
  • 3-Target Sputter System
  • Ozone cleaning system
  • RTA
>>Device Analysis Facilities
  • Gaertner Ellipsometer
  • HP4280 C&G-V Plotter
  • Keithley 6517 High Resistance System
  • Schoeffel GM 100 Monochromator
  • Boonton 72B Capacitance Meter
  • Keithley 480 Picoammeter and 616 Digital Elecctrometer
  • Sub-Micro Analytical Probe System
  • Princeton Applied Research Model 5204 AND 5301 Lock-In-Amplifier Systems
    for Device Modeling
>>Capabilities
  • Deposition of most dielectric and metallic materials by evaporation or plasma
  • Fabrication of electronic devices in a class 100 clean room
  • Electrical analysis of materials and devices
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