Micro-Electronic Fabrication Lab (MEFL) is located in 208 and 212 Bonner Hall. The clean room facility
(CRF) is an integral part of the MEFL. The CRF consists of a 300 sq. ft. class
100 room, with an adjacent 900 sq.ft. class 1000 room with humidity and
temperature control.The class 100 room contains a chemical process station,
tube furnace capable of
The class 1000 room was recently constructed to expand our clean
facility. It now contains a plasma-assisted chemical deposition system,
three-zone tube furnace capable of
An adjacent room contains a steel-jar evaporator with capability for e-beam and R.F. magnetron sputtering, another system for D.C. magnetron sputtering, and a three targets sputter system.
Measurement facilities include optical microscopes, a sub-micron probe station, current-voltage-temperature, capacitance-voltage-temperature, deep level transient spectroscopy, quasi-static C-V, cryogenic systems, and a variety of meters for measuring resistance, current, capacitance and voltage.