Multibeam interference lithography
Large area glass submicron patterns are important because of its advantages and great potentials for wide area applications - nanoimprint molding, diffraction mask patterning, diffractive waveguide devices, creating photonic crystal structures, metamaterial. In this work, we use multibeam interference lithography using photoresis to fabricate submicron patterns covering a large area glass substrate area and pattern transfer to glass substrate using subsequent reactive ion etching. The proposed glass submicron patterning approach provides the advantages of both low cost and precise tailoring of submicron geometry, appropriate for mass production.
(a), (b) submicron pattern top view (c) pattern side view (d) cross section view
multibeam interference lithography system; Nd:YVO4 laser (532nm)