- Multiple Interference Lithography
- Nano fiber
Conference Papers and Presentations::
- HS Jee, AP Zhang, R Burzynski, KT Kim, PN Prasad, and YK Yoon, “Fabrication of Large Area Glass Submicron Pattern by Multibeam Interference
Lithography and Reactive Ion Etching, ” is accepted for presentation in American Vacuum Society 55th International Symposium & Exhibition 2008.
- Jungkwun Kim, T.S. Yun, H. Jee, and Y.-K. Yoon, “Adjustable refractive index method for complex microstructures by automated dynamic mode multidirectional UV lithography,” Proceedings of International Conference of IEEE Micro Electro Mechanical Systems, Jan. 25- Jan. 29, 2009, Sorrento, Italy, pp. 733 – 736