Multidisciplinary Nano and Microsystems Laboratory

Class 100

 

• Reactive ion etcher
• Mask aligner
• Thermal evaporator
• Wet station
• Tube furnace
• Ovens
• Spin coater

Class 1000

 

• DC sputtering system
• Plasma-Assisted Chemical Vapor Deposition
• Reactive ion etcher
• E-beam evaporator
• Deionized water system
• Optical microscope
• UV ozone cleaning system
• Various meter

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RF test facility (Bonner 212)

 

• Vector network analyzer (HP 8510C)
• RF Signal generator (HP 83621A)
• S-parameter test set (HP 8514B)
• Wattmeter
• Spectrum analyzer
• RF probe station (Jr 2745)

 

E-beam Lithography facility

 

• Nano lithography:
• JEOL JSM6500F Electron Beam Microscope
• Nabity NPGS E-Beam Writing System
• CEE Model 100 Spin Coater
• Bake Oven
• K&S Model 4500 Series Wire Bonder

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General Facility

 

• Hot plate
• Syringe Pump
• High Frequency Induction Heating System
• Oscilloscope and DC Power supply
• Automated UV Lithography